Use the EKC ® chemical etching to remove residues

Etching residue removal process of polymer can be cleaned from the surface of the wafer.It is commonly used by chemical etching after EKC ® added to the spray equipment.

After etching EKC ® cleaning processing

Strictly control the EKC ® solution is very important in certain concentration range, high water content because solution can increase the risk of system corrosion, water content in the solution is too low, cannot effectively remove polymer.Visa K - PATENTS ® refractometer in semiconductor industry to provide two different control strategies, after processing automatically after each batch of wafer filled with chemicals or voluntarily, in order to ensure the wafer production safety.

The semiconductor industry refractometer can also remind staff that EKC ® may residues in IPA, prevent the IPA in subsequent IPA/drying process by EKC ® pollution.

Through the use of the semiconductor industry refractometer, fabs can obtain the following obvious advantages:

• Increasing wafer production and reducing the EKC ® consumption.
• Semiconductor industry refractometer can be used to monitor the use of different chemicals, to prevent errors.

Pulled by visa application report explains how refractometer semiconductor industry through the recommended installation location to improve the process to achieve the best performance.

The EKC ® is E.I.D u Pont DE Nemours and Company's registered trademark.

Fill out the form, you can download the PDF format of the application.

Understand fabs chemical process monitoring and defect detection of all applications

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