Wafer cleaning chemical monitoring recognition

Cleaner is one of the largest liquid chemical consumption in the fabs, among them, the standard cleaner SC - 1, 2 SC - 2 standard cleaner, dilute hydrofluoric acid (DHF) and oxygen acid detergent mixture are used to remove residues on the wafers.Factory need to strictly control all kinds of chemicals from the storage tank to the process of cleaning equipment, and between each step using deionized water (DIW), in order to prevent cross contamination.

Wafer cleaning chemical monitoring recognition

Use visa, K - PATENTS ® refractometer semiconductor industry will make fabs benefit a lot, because the refractometer can:

Continuous monitoring of the interface between the liquid and allows fluid lasts from storage tank to the cleaning equipment.
To support the DIW instant cleaning chemicals and switch.

Pulled by visa application report explains semiconductor industry refractometer installation to recommend position to improve the process to achieve the best performance.

Fill out the form, you can download the PDF format of the application.

Understand fabs chemical process monitoring and fault detection of all applications

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