半导体湿化学物质

Vaisala K-PATENTS® Semicon Refractometers PR-33-S/-23-MS are designed for real-time concentration monitoring of wet chemicals used in the silicon wafer fabrication.

半导体湿化学物质

A Vaisala K-PATENTS® Semicon Refractometer can be used to replace expensive and complex analyzers traditionally used in bulk chemical dispensing, and in point-of-use blending, spiking, etching, and monitoring applications throughout the fabrication process in wafer cleaning, wet etch, post-etch wafer cleaning, and chemical mechanical planarization (CMP), e.g in wet bench and wet process.

The semicon refractometer provides immediate feedback to the control system if the chemical is out of specification. Low and high concentration alarms can be configured to eliminate defects in container handling or equipment failure at the distribution point.

用折光仪进行实时监测的主要好处是晶圆吞吐量增加的形式的潜在产量提高。这是通过延长的洗澡寿命和化学消耗的优化来实现的。确切的化学流取决于浴室的化学和序列，化学浓度，清洁时间和温度。

Vaisala’s application note explains how a semicon refractometer can improve different process steps with recommended installation for best performance.

通过填写表格下载申请注（PDF）。

Discover all applications in Fab chemical process monitoring and fault detection

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